Revision as of 05:08, 26 April 2016

Semiconductor lithography processes technology

1 nm 2 nm 3 nm 5 nm 7 nm 10 nm 14 nm 16 nm 20 nm 22 nm 28 nm 32 nm 40 nm 45 nm 55 nm 65 nm 80 nm 90 nm 110 nm 130 nm 150 nm 180 nm 220 nm 240 nm 250 nm 280 nm 350 nm 500 nm 600 nm 650 nm 700 nm 750 nm 800 nm 1 µm 1.2 µm 1.3 µm 1.5 µm 2 µm 2.5 µm 3 µm 3.5 µm 5 µm 6 µm 7 µm 8 µm 10 µm 16 µm 20 µm 50 µm

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The 8 µm lithography process was the semiconductor process technology used by some semiconductor companies during the late 1960s through the early 1970s. The typical wafer size for this process at companies such as Fairchild and TI were 2 inch (51 mm).

Industry

Microprocessors

• TI
  • TMS1000
• MOS Technology
  • MCS6500

8 µm Chips

• Intel
  • 1103, 1Kb DRAM, worlds first commercial DRAM

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