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Difference between revisions of "1.3 µm lithography process"
(Created page with "{{lithography processes}} The '''1.2 µm lithography process''' was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1...") |
(No difference)
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Revision as of 21:58, 24 April 2016
Semiconductor lithography processes technology |
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The 1.2 µm lithography process was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by 1 µm, 800 nm, and 650 nm processes.
Industry
Fab |
---|
Process Name |
1st Production |
|
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
SRAM bit cell |
Motorola | Hitachi | Fujitsu |
---|---|---|
1987 | 1987 | |
Value | Value | Value |
? nm | ? nm | ? nm |
? nm | ? nm | ? nm |
? µm2 | ? µm2 | ? µm2 |