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Difference between revisions of "1 µm lithography process"
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| − | {{ | + | {{lithography processes}} |
| − | The ''' | + | The '''1 µm lithography process''' was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by [[800 nm]], [[650 nm]], and [[600 nm]] processes. |
| − | == | + | == Industry == |
| − | + | {{scrolling table/top|style=text-align: right; | first=Fab | |
| − | + | |Process Name | |
| + | |1st Production | ||
| + | | | ||
| + | |Contacted Gate Pitch | ||
| + | |Interconnect Pitch (M1P) | ||
| + | |SRAM bit cell | ||
| + | }} | ||
| + | {{scrolling table/mid}} | ||
| + | |- | ||
| + | ! [[Intel]] (CHMOS IV) !! [[HP]] | ||
| + | |- style="text-align: center;" | ||
| + | | P648 || CMOS26B | ||
| + | |- style="text-align: center;" | ||
| + | | 1987 || 1991 | ||
| + | |- | ||
| + | ! Value !! Value | ||
| + | |- | ||
| + | | ? nm || ? nm | ||
| + | |- | ||
| + | | ? nm || ? nm | ||
| + | |- | ||
| + | | ? µm<sup>2</sup> || ? µm<sup>2</sup> | ||
| + | {{scrolling table/end}} | ||
| + | |||
| + | == 1 µm Microprocessors == | ||
| + | * Intel | ||
| + | ** {{intel|80388 DX}} | ||
| + | ** {{intel|80386 SX}} | ||
| + | ** {{intel|80486 DX}} | ||
| + | * MIPS | ||
| + | ** {{mips|R4000}} | ||
| + | * HP | ||
| + | ** {{hp|PA-7000}} | ||
| + | == 1 µm Microcontrollers == | ||
| + | * Intel | ||
| + | ** {{intel|MCS-96}} | ||
| − | |||
[[Category:Lithography]] | [[Category:Lithography]] | ||
Revision as of 21:00, 24 April 2016
The 1 µm lithography process was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by 800 nm, 650 nm, and 600 nm processes.
Industry
| Fab |
|---|
| Process Name |
| 1st Production |
| |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| SRAM bit cell |
1 µm Microprocessors
1 µm Microcontrollers
- Intel