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Difference between revisions of "220 nm lithography process"
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== 220 nm Microarchitectures == | == 220 nm Microarchitectures == | ||
{{expand list}} | {{expand list}} | ||
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+ | [[category:lithography]] |
Latest revision as of 05:10, 20 July 2018
Semiconductor lithography processes technology |
|
The 220 nanometer (220 nm) lithography process is was semiconductor manufacturing process following the 350 nm process. Commercial integrated circuit manufacturing using 220 process began in late 1990s. 220 nm and was phased out and later replaced by 180 nm processes.
Industry[edit]
Fab |
---|
Process Name |
1st Production |
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
Metal Layers |
SRAM bit cell |
220 nm Microprocessors[edit]
This list is incomplete; you can help by expanding it.
220 nm Microarchitectures[edit]
This list is incomplete; you can help by expanding it.