Semiconductor & Computer Engineering
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Difference between revisions of "1 µm lithography process"
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| − | The '''1 µm lithography process''' was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by [[800 nm]], [[650 nm]], and [[600 nm]] processes. | + | The '''1 µm lithography process''' was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by [[800 nm]], [[700 nm]], [[650 nm]], and [[600 nm]] processes. |
== Industry == | == Industry == | ||
Revision as of 01:13, 15 May 2016
Semiconductor lithography processes technology
The 1 µm lithography process was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by 800 nm, 700 nm, 650 nm, and 600 nm processes.
Industry
| Fab |
|---|
| Process Name |
| 1st Production |
| |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| SRAM bit cell |
| Intel (CHMOS IV) | HP | National (BiCMOS) |
|---|---|---|
| P648 | CMOS26 | BiCMOS III |
| 1987 | 1991 | 1988 |
| Value | Value | Value |
| ? nm | ? nm | ? nm |
| ? nm | ? nm | ? nm |
| 220 µm2 | ? µm2 | ? µm2 |
1 µm Microprocessors
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1 µm Microcontrollers
- Intel
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