Semiconductor & Computer Engineering
From WikiChip
Difference between revisions of "220 nm lithography process"
(→220 nm Microprocessors) |
|||
| Line 1: | Line 1: | ||
{{lithography processes}} | {{lithography processes}} | ||
| − | The '''220 nm lithography process''' is was semiconductor manufacturing process following the [[350 nm lithography process|350 nm process]]. Commercial [[integrated circuit]] manufacturing using 220 process began in late 1990s. 220 nm and was phased out and later replaced by [[180 nm]] processes. | + | The '''220 nanometer (220 nm) lithography process''' is was semiconductor manufacturing process following the [[350 nm lithography process|350 nm process]]. Commercial [[integrated circuit]] manufacturing using 220 process began in late 1990s. 220 nm and was phased out and later replaced by [[180 nm]] processes. |
== Industry == | == Industry == | ||
Revision as of 03:54, 24 May 2016
Semiconductor lithography processes technology
The 220 nanometer (220 nm) lithography process is was semiconductor manufacturing process following the 350 nm process. Commercial integrated circuit manufacturing using 220 process began in late 1990s. 220 nm and was phased out and later replaced by 180 nm processes.
Industry
| Fab |
|---|
| Process Name |
| 1st Production |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| Metal Layers |
| SRAM bit cell |
220 nm Microprocessors
This list is incomplete; you can help by expanding it.
220 nm Microarchitectures
This list is incomplete; you can help by expanding it.