From WikiChip
Difference between revisions of "220 nm lithography process"

(Created page with "{{lithography processes}} The '''220 nm lithography process''' is was semiconductor manufacturing process following the 350 nm process. Commerci...")
 
(→‎Industry)
Line 13: Line 13:
 
{{scrolling table/mid}}
 
{{scrolling table/mid}}
 
|-
 
|-
−
! [[Motorola]]
+
! [[Motorola]] !! [[IBM]]
 
|- style="text-align: center;"
 
|- style="text-align: center;"
−
| HiPerMOS 5
+
| HiPerMOS 5 || CMOS-7S
 
|-
 
|-
−
| 1999
+
| 1999 || 1999
 
|-  
 
|-  
−
| ? nm
+
| ? nm || ? nm
 
|-
 
|-
−
| ? nm
+
| ? nm || ?nm
 
|-
 
|-
−
| ?
+
| 6 || 6
 
|-
 
|-
−
| ? µm<sup>2</sup>
+
| ? µm<sup>2</sup> || ? µm<sup>2</sup>
 
{{scrolling table/end}}
 
{{scrolling table/end}}
  

Revision as of 00:32, 27 April 2016

basic wafer drawing.svg Semiconductor lithography processes technology
v · d · e

The 220 nm lithography process is was semiconductor manufacturing process following the 350 nm process. Commercial integrated circuit manufacturing using 220 process began in late 1990s. 220 nm and was phased out and later replaced by 180 nm processes.

Industry

Fab
Process Name​
1st Production​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
Metal Layers​
SRAM bit cell
Motorola IBM
HiPerMOS 5 CMOS-7S
1999 1999
 ? nm  ? nm
 ? nm  ?nm
6 6
 ? µm2  ? µm2

220 nm Microprocessors

This list is incomplete; you can help by expanding it.

220 nm Microarchitectures

This list is incomplete; you can help by expanding it.

Retrieved from "https://en.wikichip.org/w/index.php?title=220_nm_lithography_process&oldid=17442"