Semiconductor & Computer Engineering
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Difference between revisions of "280 nm lithography process"
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| − | The '''280 nm lithography process''' is was semiconductor manufacturing process following the [[350 nm lithography process|350 nm process]]. Commercial [[integrated circuit]] manufacturing using 280 nm process began in late 1990s. 280 nm and was phased out and later replaced by [[250 nm]], [[220 nm]], and [[180 nm]] processes. | + | The '''280 nanometer (280 nm) lithography process''' is was semiconductor manufacturing process following the [[350 nm lithography process|350 nm process]]. Commercial [[integrated circuit]] manufacturing using 280 nm process began in late 1990s. 280 nm and was phased out and later replaced by [[250 nm]], [[220 nm]], and [[180 nm]] processes. |
== Industry == | == Industry == | ||
Revision as of 03:53, 24 May 2016
Semiconductor lithography processes technology
The 280 nanometer (280 nm) lithography process is was semiconductor manufacturing process following the 350 nm process. Commercial integrated circuit manufacturing using 280 nm process began in late 1990s. 280 nm and was phased out and later replaced by 250 nm, 220 nm, and 180 nm processes.
Industry
| Fab |
|---|
| Process Name |
| 1st Production |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| Metal Layers |
| SRAM bit cell |
| Motorola |
|---|
| HiPerMOS 3 |
| 1997 |
| ? nm |
| ? nm |
| ? |
| ? µm2 |
280 nm Microprocessors
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280 nm Microarchitectures
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