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Difference between revisions of "7 nm lithography process"

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{{lithography processes}}
 
{{lithography processes}}
The '''7 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[10 nm lithography process|10 nm process]] node. Commercial [[integrated circuit]] manufacturing using 7 nm process is set to begin sometimes in 2019 or 2020. This technology will be replaced by [[5 nm lithography process|5 nm process]] around 2022.
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The '''7 nanometer (7 nm) lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[10 nm lithography process|10 nm process]] node. Commercial [[integrated circuit]] manufacturing using 7 nm process is set to begin sometimes in 2019 or 2020. This technology will be replaced by [[5 nm lithography process|5 nm process]] around 2022.
  
 
== Industry ==
 
== Industry ==

Revision as of 04:56, 24 May 2016

The 7 nanometer (7 nm) lithography process is a full node semiconductor manufacturing process following the 10 nm process node. Commercial integrated circuit manufacturing using 7 nm process is set to begin sometimes in 2019 or 2020. This technology will be replaced by 5 nm process around 2022.

Industry

Fab
Process Name​
1st Production​
 ​
Fin Pitch​
Fin Width​
Fin Height​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell (HP)​
SRAM bit cell (HD)
Intel Samsung TSMC
P1276
 
Value 10 nm Δ Value 10 nm Δ Value 10 nm Δ
 ? nm  ?x  ? nm  ?x  ? nm  ?x
 ? nm  ?x  ? nm  ?x  ? nm  ?x
 ? nm  ?x  ? nm  ?x  ? nm  ?x
 ? nm  ?x  ? nm  ?x  ? nm  ?x
 ? nm  ?x  ? nm  ?x  ? nm  ?x
 ? µm2  ?x  ? µm2  ?x  ? µm2  ?x
 ? µm2  ?x  ? µm2  ?x  ? µm2  ?x

7 nm Microprocessors

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7 nm System on Chips

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7 nm Microarchitectures

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