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Difference between revisions of "1 µm lithography process"
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! [[Intel]] (CHMOS IV) !! [[HP]] | ! [[Intel]] (CHMOS IV) !! [[HP]] | ||
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− | | P648 || | + | | P648 || CMOS26 |
|- style="text-align: center;" | |- style="text-align: center;" | ||
| 1987 || 1991 | | 1987 || 1991 |
Revision as of 21:15, 24 April 2016
Semiconductor lithography processes technology |
|
The 1 µm lithography process was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by 800 nm, 650 nm, and 600 nm processes.
Industry
Fab |
---|
Process Name |
1st Production |
|
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
SRAM bit cell |
1 µm Microprocessors
1 µm Microcontrollers
- Intel