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Difference between revisions of "10 µm lithography process"
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{{Lithography processes}} | {{Lithography processes}} | ||
The '''10μm lithography process''' was the semiconductor process technology used by the major semiconductor companies during the years of 1970 and 1973. The first microprocessors, such as the [[Intel]] [[Intel 4004|4004]] and the [[Intel 4040|4040]] used 10μm technology. | The '''10μm lithography process''' was the semiconductor process technology used by the major semiconductor companies during the years of 1970 and 1973. The first microprocessors, such as the [[Intel]] [[Intel 4004|4004]] and the [[Intel 4040|4040]] used 10μm technology. | ||
+ | {{stub}} | ||
[[Category:Lithography]] | [[Category:Lithography]] |
Revision as of 20:07, 28 October 2015
Semiconductor lithography processes technology |
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The 10μm lithography process was the semiconductor process technology used by the major semiconductor companies during the years of 1970 and 1973. The first microprocessors, such as the Intel 4004 and the 4040 used 10μm technology.
This article is still a stub and needs your attention. You can help improve this article by editing this page and adding the missing information. |