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Difference between revisions of "Template:lithography processes"

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<div class="noprint" style="float:right; box-shadow: 0 0 4px #BDBDBD inset; background-color: #FFFFFF; border-radius: 5px; width:150px; padding:10px; margin-left: 10px; margin-bottom: 15px;">
 
<div class="noprint" style="float:right; box-shadow: 0 0 4px #BDBDBD inset; background-color: #FFFFFF; border-radius: 5px; width:150px; padding:10px; margin-left: 10px; margin-bottom: 15px;">
 
{| cellspacing="0"
 
{| cellspacing="0"
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| style="width: 150px; text-align: center; font-size: 10px; font-weight: bold; color: #4A98D9;" | Semiconductor lithography processes technology
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| style="width: 150px; text-align: center; font-size: 10px; font-weight: bold; color: #4A98D9;" | [[File:basic wafer drawing.svg|link=|75px|class=wikichip_ogimage]] Semiconductor lithography processes technology
 
|-
 
|-
 
| style="padding-left: 10px;" |
 
| style="padding-left: 10px;" |
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:* [[1 nm lithography process|1 nm]]
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:* [[2 nm lithography process|2 nm]]
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:* [[3 nm lithography process|3 nm]]
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:* [[5 nm lithography process|5 nm]]
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:* [[7 nm lithography process|7 nm]]
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:* [[10 nm lithography process|10 nm]]
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:* [[14 nm lithography process|14 nm]]
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:* [[16 nm lithography process|16 nm]]
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:* [[20 nm lithography process|20 nm]]
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:* [[22 nm lithography process|22 nm]]
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:* [[28 nm lithography process|28 nm]]
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:* [[32 nm lithography process|32 nm]]
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:* [[40 nm lithography process|40 nm]]
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:* [[45 nm lithography process|45 nm]]
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:* [[55 nm lithography process|55 nm]]
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:* [[65 nm lithography process|65 nm]]
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:* [[80 nm lithography process|80 nm]]
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:* [[90 nm lithography process|90 nm]]
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:* [[110 nm lithography process|110 nm]]
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:* [[130 nm lithography process|130 nm]]
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:* [[150 nm lithography process|150 nm]]
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:* [[180 nm lithography process|180 nm]]
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:* [[220 nm lithography process|220 nm]]
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:* [[240 nm lithography process|240 nm]]
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:* [[250 nm lithography process|250 nm]]
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:* [[280 nm lithography process|280 nm]]
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:* [[350 nm lithography process|350 nm]]
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:* [[500 nm lithography process|500 nm]]
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:* [[600 nm lithography process|600 nm]]
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:* [[650 nm lithography process|650 nm]]
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:* [[700 nm lithography process|700 nm]]
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:* [[750 nm lithography process|750 nm]]
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:* [[800 nm lithography process|800 nm]]
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:* [[1 µm lithography process|1 µm]]
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:* [[1.2 µm lithography process|1.2 µm]]
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:* [[1.3 µm lithography process|1.3 µm]]
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:* [[1.5 µm lithography process|1.5 µm]]
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:* [[2 µm lithography process|2 µm]]
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:* [[2.5 µm lithography process|2.5 µm]]
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:* [[3 µm lithography process|3 µm]]
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:* [[3.5 µm lithography process|3.5 µm]]
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:* [[5 µm lithography process|5 µm]]
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:* [[6 µm lithography process|6 µm]]
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:* [[7 µm lithography process|7 µm]]
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:* [[8 µm lithography process|8 µm]]
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:* [[10 µm lithography process|10 µm]]
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:* [[16 µm lithography process|16 µm]]
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:* [[20 µm lithography process|20 µm]]
 
:* [[50 µm lithography process|50 µm]]
 
:* [[50 µm lithography process|50 µm]]
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:* [[20 µm lithography process|20 µm]]
 
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:* [[16 µm lithography process|16 µm]]
 
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:* [[10 µm lithography process|10 µm]]
 
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:* [[8 µm lithography process|8 µm]]
 
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:* [[7 µm lithography process|7 µm]]
 
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:* [[6 µm lithography process|6 µm]]
 
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:* [[5 µm lithography process|5 µm]]
 
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:* [[3.5 µm lithography process|3.5 µm]]
 
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:* [[3 µm lithography process|3 µm]]
 
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:* [[2.5 µm lithography process|2.5 µm]]
 
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:* [[2 µm lithography process|2 µm]]
 
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:* [[1.5 µm lithography process|1.5 µm]]
 
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:* [[1.3 µm lithography process|1.3 µm]]
 
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:* [[1.2 µm lithography process|1.2 µm]]
 
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:* [[1 µm lithography process|1 µm]]
 
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:* [[800 nm lithography process|800 nm]]
 
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:* [[750 nm lithography process|750 nm]]
 
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:* [[700 nm lithography process|700 nm]]
 
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:* [[650 nm lithography process|650 nm]]
 
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:* [[600 nm lithography process|600 nm]]
 
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:* [[500 nm lithography process|500 nm]]
 
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:* [[350 nm lithography process|350 nm]]
 
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:* [[280 nm lithography process|280 nm]]
 
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:* [[250 nm lithography process|250 nm]]
 
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:* [[240 nm lithography process|240 nm]]
 
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:* [[220 nm lithography process|220 nm]]
 
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:* [[180 nm lithography process|180 nm]]
 
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:* [[150 nm lithography process|150 nm]]
 
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:* [[130 nm lithography process|130 nm]]
 
−
:* [[110 nm lithography process|110 nm]]
 
−
:* [[90 nm lithography process|90 nm]]
 
−
:* [[80 nm lithography process|80 nm]]
 
−
:* [[65 nm lithography process|65 nm]]
 
−
:* [[55 nm lithography process|55 nm]]
 
−
:* [[45 nm lithography process|45 nm]]
 
−
:* [[40 nm lithography process|40 nm]]
 
−
:* [[32 nm lithography process|32 nm]]
 
−
:* [[28 nm lithography process|28 nm]]
 
−
:* [[22 nm lithography process|22 nm]]
 
−
:* [[20 nm lithography process|20 nm]]
 
−
:* [[16 nm lithography process|16 nm]]
 
−
:* [[14 nm lithography process|14 nm]]
 
−
:* [[10 nm lithography process|10 nm]]
 
−
:* [[7 nm lithography process|7 nm]]
 
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:* [[5 nm lithography process|5 nm]]
 
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:* [[3 nm lithography process|3 nm]]
 
 
|}{{Navbar|Template:lithography processes|text=|mini=1|style=float:right;}}
 
|}{{Navbar|Template:lithography processes|text=|mini=1|style=float:right;}}
 
</div>
 
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Latest revision as of 02:40, 5 September 2021

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