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Difference between revisions of "600 nm lithography process"

 
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! [[Intel]] (BiCMOS) !! [[Intel]] (CMOS) !! [[NEC]] !! [[IBM]] !! [[Motorola]] !! [[HP]]
 
! [[Intel]] (BiCMOS) !! [[Intel]] (CMOS) !! [[NEC]] !! [[IBM]] !! [[Motorola]] !! [[HP]]
 
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|- style="text-align: center;"
| || || || CMOS-4S || || CMOS14B
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| || P652, P653 || || CMOS-4S || || CMOS14B
 
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| 1994 || 1994 || 1992 || 1993 || 1994 ||  
 
| 1994 || 1994 || 1992 || 1993 || 1994 ||  
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| ? nm  || ? nm || ? nm || ? nm || ? nm || ? nm
 
| ? nm  || ? nm || ? nm || ? nm || ? nm || ? nm
 
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| ? µm<sup>2</sup> ||  ? µm<sup>2</sup> ||  ? µm<sup>2</sup> ||  ? µm<sup>2</sup> ||  ? µm<sup>2</sup> ||  ? µm<sup>2</sup>
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| ? µm² ||  ? µm² ||  ? µm² ||  ? µm² ||  ? µm² ||  ? µm²
 
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== 600 nm Microarchitectures ==
 
== 600 nm Microarchitectures ==
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* Intel
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** {{intel|microarchitectures/80486|80486}} (later models)
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** {{intel|microarchitectures/p5|P5}}
 
{{expand list}}
 
{{expand list}}
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[[category:lithography]]

Latest revision as of 05:15, 20 July 2018

The 600 nanometer (600 nm) lithography process was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 1990s. This process was later replaced by 500 nm and 350 nm processes.

Industry[edit]

Fab
Process Name​
1st Production​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Intel (BiCMOS) Intel (CMOS) NEC IBM Motorola HP
P652, P653 CMOS-4S CMOS14B
1994 1994 1992 1993 1994
Value Value Value Value Value Value
 ? nm  ? nm  ? nm  ? nm  ? nm  ? nm
 ? nm  ? nm  ? nm  ? nm  ? nm  ? nm
 ? µm²  ? µm²  ? µm²  ? µm²  ? µm²  ? µm²

600 nm Microprocessors[edit]

This list is incomplete; you can help by expanding it.

600 nm Microarchitectures[edit]

This list is incomplete; you can help by expanding it.