Difference between revisions of "Template:lithography processes"

Latest revision as of 02:40, 5 September 2021

Semiconductor lithography processes technology

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 <div class="noprint" style="float:right; box-shadow: 0 0 4px #BDBDBD inset; background-color: #FFFFFF; border-radius: 5px; width:150px; padding:10px; margin-left: 10px; margin-bottom: 15px;">
 {| cellspacing="0"
-| style="width: 150px; text-align: center; font-size: 10px; font-weight: bold; color: #4A98D9;" |
+| style="width: 150px; text-align: center; font-size: 10px; font-weight: bold; color: #4A98D9;" | [[File:basic wafer drawing.svg|link=|75px|class=wikichip_ogimage]] Semiconductor lithography processes technology
-Semiconductor lithography processes technology
 |-
 | style="padding-left: 10px;" |
-:* [[10μm lithography process|10μm]]
+:* [[1 nm lithography process|1 nm]]
-:* [[8μm lithography process|8μm]]
+:* [[2 nm lithography process|2 nm]]
-:* [[6μm lithography process|6μm]]
+:* [[3 nm lithography process|3 nm]]
-:* [[5μm lithography process|5μm]]
+:* [[5 nm lithography process|5 nm]]
-:* [[3.5μm lithography process|3.5μm]]
+:* [[7 nm lithography process|7 nm]]
-:* [[3μm lithography process|3μm]]
+:* [[10 nm lithography process|10 nm]]
-:* [[2μm lithography process|2μm]]
+:* [[14 nm lithography process|14 nm]]
-:* [[1.5μm lithography process|1.5μm]]
+:* [[16 nm lithography process|16 nm]]
-:* [[1μm lithography process|1μm]]
+:* [[20 nm lithography process|20 nm]]
-:* [[0.8μm lithography process|0.8μm]]
+:* [[22 nm lithography process|22 nm]]
-:* [[0.6μm lithography process|0.6μm]]
+:* [[28 nm lithography process|28 nm]]
-:* [[0.5μm lithography process|0.5μm]]
+:* [[32 nm lithography process|32 nm]]
-:* [[0.35μm lithography process|0.35μm]]
+:* [[40 nm lithography process|40 nm]]
-:* [[0.25μm lithography process|0.25μm]]
+:* [[45 nm lithography process|45 nm]]
-:* [[0.22μm lithography process|0.22μm]]
+:* [[55 nm lithography process|55 nm]]
-:* [[350nm lithography process|350nm]]
+:* [[65 nm lithography process|65 nm]]
-:* [[250nm lithography process|250nm]]
+:* [[80 nm lithography process|80 nm]]
-:* [[220nm lithography process|220nm]]
+:* [[90 nm lithography process|90 nm]]
-:* [[180nm lithography process|180nm]]
+:* [[110 nm lithography process|110 nm]]
-:* [[150nm lithography process|150nm]]
+:* [[130 nm lithography process|130 nm]]
-:* [[130nm lithography process|130nm]]
+:* [[150 nm lithography process|150 nm]]
-:* [[110nm lithography process|110nm]]
+:* [[180 nm lithography process|180 nm]]
-:* [[90nm lithography process|90nm]]
+:* [[220 nm lithography process|220 nm]]
-:* [[80nm lithography process|80nm]]
+:* [[240 nm lithography process|240 nm]]
-:* [[65nm lithography process|65nm]]
+:* [[250 nm lithography process|250 nm]]
-:* [[45nm lithography process|45nm]]
+:* [[280 nm lithography process|280 nm]]
-:* [[40nm lithography process|40nm]]
+:* [[350 nm lithography process|350 nm]]
-:* [[32nm lithography process|32nm]]
+:* [[500 nm lithography process|500 nm]]
-:* [[28nm lithography process|28nm]]
+:* [[600 nm lithography process|600 nm]]
-:* [[22nm lithography process|22nm]]
+:* [[650 nm lithography process|650 nm]]
-|}
+:* [[700 nm lithography process|700 nm]]
-{{Navbar|Template:Lithography processes|text=|mini=1|style=float:right;}}
+:* [[750 nm lithography process|750 nm]]
+:* [[800 nm lithography process|800 nm]]
+:* [[1 µm lithography process|1 µm]]
+:* [[1.2 µm lithography process|1.2 µm]]
+:* [[1.3 µm lithography process|1.3 µm]]
+:* [[1.5 µm lithography process|1.5 µm]]
+:* [[2 µm lithography process|2 µm]]
+:* [[2.5 µm lithography process|2.5 µm]]
+:* [[3 µm lithography process|3 µm]]
+:* [[3.5 µm lithography process|3.5 µm]]
+:* [[5 µm lithography process|5 µm]]
+:* [[6 µm lithography process|6 µm]]
+:* [[7 µm lithography process|7 µm]]
+:* [[8 µm lithography process|8 µm]]
+:* [[10 µm lithography process|10 µm]]
+:* [[16 µm lithography process|16 µm]]
+:* [[20 µm lithography process|20 µm]]
+:* [[50 µm lithography process|50 µm]]
+|}{{Navbar|Template:lithography processes|text=|mini=1|style=float:right;}}
 </div>
 <noinclude>
 [[Category:Lithography]]
 </noinclude>

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Latest revision as of 02:40, 5 September 2021