Difference between revisions of "Template:lithography processes"

Latest revision as of 19:41, 18 March 2025

Semiconductor lithography processes technology

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 <div class="noprint" style="float:right; box-shadow: 0 0 4px #BDBDBD inset; background-color: #FFFFFF; border-radius: 5px; width:150px; padding:10px; margin-left: 10px; margin-bottom: 15px;">
 {| cellspacing="0"
-| style="width: 150px; text-align: center; font-size: 10px; font-weight: bold; color: #4A98D9;" |
+| style="width: 150px; text-align: center; font-size: 10px; font-weight: bold; color: #4A98D9;" | [[File:basic wafer drawing.svg|link=|75px|class=wikichip_ogimage]] Semiconductor lithography processes technology
-Semiconductor lithography processes technology
 |-
 | style="padding-left: 10px;" |
-:* [[10μm lithography process|10μm]]
+* [[1 nm lithography process|1 nm]] • [[18A]]
-:* [[6μm lithography process|6μm]]
+* [[2 nm lithography process|2 nm]] • [[3 nm lithography process|3 nm]]
-|}
+* [[5 nm lithography process|5 nm]] • [[7 nm lithography process|7 nm]]
-{{Navbar|Template:Lithography processes|text=|mini=1|style=float:right;}}
+* [[10 nm lithography process|10 nm]] • [[12 nm]]
+* [[14 nm lithography process|14 nm]] • [[16 nm lithography process|16 nm]]
+* [[20 nm lithography process|20 nm]] • [[22 nm lithography process|22 nm]]
+* [[28 nm lithography process|28 nm]] • [[32 nm lithography process|32 nm]]
+* [[40 nm lithography process|40 nm]] • [[45 nm lithography process|45 nm]]
+* [[55 nm lithography process|55 nm]] • [[65 nm lithography process|65 nm]]
+* [[80 nm lithography process|80 nm]] • [[90 nm lithography process|90 nm]]
+* [[110 nm lithography process|110 nm]] • [[130 nm lithography process|130 nm]]
+* [[150 nm lithography process|150 nm]] • [[180 nm lithography process|180 nm]]
+* [[220 nm lithography process|220 nm]] • [[240 nm lithography process|240 nm]]
+* [[250 nm lithography process|250 nm]] • [[280 nm lithography process|280 nm]]
+* [[350 nm lithography process|350 nm]] • [[500 nm lithography process|500 nm]]
+* [[600 nm lithography process|600 nm]] • [[650 nm lithography process|650 nm]]
+* [[700 nm lithography process|700 nm]] • [[750 nm lithography process|750 nm]]
+* [[800 nm lithography process|800 nm]]
+* [[1 µm lithography process|1 µm]] • [[1.2 µm lithography process|1.2 µm]]
+* [[1.3 µm lithography process|1.3 µm]] • [[1.5 µm lithography process|1.5 µm]]
+* [[2 µm lithography process|2 µm]] • [[2.5 µm lithography process|2.5 µm]]
+* [[3 µm lithography process|3 µm]] • [[3.5 µm lithography process|3.5 µm]]
+* [[5 µm lithography process|5 µm]] • [[6 µm lithography process|6 µm]]
+* [[7 µm lithography process|7 µm]] • [[8 µm lithography process|8 µm]]
+* [[10 µm lithography process|10 µm]] • [[16 µm lithography process|16 µm]]
+* [[20 µm lithography process|20 µm]] • [[50 µm lithography process|50 µm]]
+|}{{Navbar|Template:lithography processes|text=|mini=1|style=float:right;}}
 </div>
 <noinclude>
 [[Category:Lithography]]
 </noinclude>

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Latest revision as of 19:41, 18 March 2025