Semiconductor & Computer Engineering
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Difference between revisions of "2.5 µm lithography process"
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{{Lithography processes}} | {{Lithography processes}} | ||
The '''2.5 μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the late 1970s to early 1980s. This process was later superseded by [[2 µm]], [[1.5 µm]], and [[1 µm]] processes. | The '''2.5 μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the late 1970s to early 1980s. This process was later superseded by [[2 µm]], [[1.5 µm]], and [[1 µm]] processes. | ||
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| + | == Industry == | ||
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| + | === Harris === | ||
| + | Harris Corporation operated a 2.5 μm CMOS process, '''SAJI IV''' (Self-Aligned) . | ||
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| + | == 2.5 μm microprocessors == | ||
| + | * DEC | ||
| + | ** {{decc|J11}} | ||
== 2.5 μm microcontrollers == | == 2.5 μm microcontrollers == | ||
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{{expand list}} | {{expand list}} | ||
| − | + | [[category:lithography]] | |
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Latest revision as of 05:20, 20 July 2018
Semiconductor lithography processes technology
The 2.5 μm lithography process was the semiconductor process technology used by some semiconductor companies during the late 1970s to early 1980s. This process was later superseded by 2 µm, 1.5 µm, and 1 µm processes.
Industry[edit]
Harris[edit]
Harris Corporation operated a 2.5 μm CMOS process, SAJI IV (Self-Aligned) .
2.5 μm microprocessors[edit]
- DEC
2.5 μm microcontrollers[edit]
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