From WikiChip
Difference between revisions of "Template:lithography processes"

m
Line 1: Line 1:
 
<div class="noprint" style="float:right; box-shadow: 0 0 4px #BDBDBD inset; background-color: #FFFFFF; border-radius: 5px; width:150px; padding:10px; margin-left: 10px; margin-bottom: 15px;">
 
<div class="noprint" style="float:right; box-shadow: 0 0 4px #BDBDBD inset; background-color: #FFFFFF; border-radius: 5px; width:150px; padding:10px; margin-left: 10px; margin-bottom: 15px;">
 
{| cellspacing="0"
 
{| cellspacing="0"
| style="width: 150px; text-align: center; font-size: 10px; font-weight: bold; color: #4A98D9;" | Semiconductor lithography processes technology
+
| style="width: 150px; text-align: center; font-size: 10px; font-weight: bold; color: #4A98D9;" |
 +
[[File:basic wafer drawing.svg|link=|75px|class=center]]
 +
Semiconductor lithography processes technology
 
|-
 
|-
 
| style="padding-left: 10px;" |
 
| style="padding-left: 10px;" |

Revision as of 06:10, 28 June 2018