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Difference between revisions of "150 nm lithography process"

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Revision as of 00:53, 27 April 2016

basic wafer drawing.svg Semiconductor lithography processes technology
v · d · e

The 150 nm lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 180 nm and 130 nm processes. Commercial integrated circuit manufacturing using 55 nm process began in early 2000s. This technology superseded by commercial 130 nm process by 2001.

Industry

Fab
Process Name​
1st Production​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
TSMC Fujitsu
CS-85
2000 2002
Value 180 nm Δ Value 180 nm Δ
 ? nm  ?x  ? nm  ?x
 ? nm  ?x  ? nm  ?x
3.42 µm2 0.74x  ? µm2  ?x

150 nm Microprocessors

This list is incomplete; you can help by expanding it.

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