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Difference between revisions of "3.5 µm lithography process"
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{{Lithography processes}} | {{Lithography processes}} | ||
The '''3.5 μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the mid 1970s. This process was later superseded by [[3 µm]], [[2 µm]], and [[1.5 µm]] processes. | The '''3.5 μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the mid 1970s. This process was later superseded by [[3 µm]], [[2 µm]], and [[1.5 µm]] processes. | ||
+ | |||
+ | == Industry == | ||
+ | {{scrolling table/top|style=text-align: right; | first=Fab | ||
+ | |Process Name | ||
+ | |1st Production | ||
+ | |Contacted Gate Pitch | ||
+ | |Interconnect Pitch | ||
+ | |Metal Layers | ||
+ | |Technology | ||
+ | |Wafer | ||
+ | }} | ||
+ | {{scrolling table/mid}} | ||
+ | |- | ||
+ | ! [[Motorola]] | ||
+ | |- style="text-align: center;" | ||
+ | | | ||
+ | |- style="text-align: center;" | ||
+ | | | ||
+ | |- | ||
+ | | ? nm | ||
+ | |- | ||
+ | | ? nm | ||
+ | |- | ||
+ | | ? | ||
+ | |- | ||
+ | | nMOS | ||
+ | |- | ||
+ | | ?" | ||
+ | {{scrolling table/end}} | ||
== 3.5 μm microcontrollers == | == 3.5 μm microcontrollers == | ||
− | * {{bell|BELLMAC-4| | + | * Bell Labs |
+ | ** {{bell|BELLMAC-4}} | ||
+ | * Motorola | ||
+ | ** {{motorola|68000}} | ||
+ | ** {{motorola|68010}} | ||
{{expand list}} | {{expand list}} | ||
Revision as of 21:43, 26 April 2016
The 3.5 μm lithography process was the semiconductor process technology used by some semiconductor companies during the mid 1970s. This process was later superseded by 3 µm, 2 µm, and 1.5 µm processes.
Industry
Fab |
---|
Process Name |
1st Production |
Contacted Gate Pitch |
Interconnect Pitch |
Metal Layers |
Technology |
Wafer |
Motorola |
---|
? nm |
? nm |
? |
nMOS |
?" |
3.5 μm microcontrollers
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