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Difference between revisions of "1.2 µm lithography process"
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* MIPS (Fab'ed by [[NEC]]) | * MIPS (Fab'ed by [[NEC]]) | ||
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[[Category:Lithography]] | [[Category:Lithography]] |
Revision as of 22:16, 24 April 2016
Semiconductor lithography processes technology |
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The 1.2 µm lithography process was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by 1 µm, 800 nm, and 650 nm processes.
Industry
Fab |
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Process Name |
1st Production |
|
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
SRAM bit cell |
1.2 µm Microprocessors
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