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* MIPS (Fab'ed by [[NEC]])
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[[Category:Lithography]]
 
[[Category:Lithography]]

Revision as of 22:05, 24 April 2016

basic wafer drawing.svg Semiconductor lithography processes technology
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The 1.2 µm lithography process was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by 1 µm, 800 nm, and 650 nm processes.

Industry

Fab
Process Name​
1st Production​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Intel NEC
 
1987 1991
Value Value
 ? nm  ? nm
 ? nm  ? nm
 ? µm2  ? µm2

1.2 µm Microprocessors

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