Latest revision as of 07:36, 19 April 2025

Semiconductor lithography processes technology

1 nm • 18A 2 nm • 3 nm 5 nm • 7 nm 10 nm • 12 nm 14 nm • 16 nm 20 nm • 22 nm 28 nm • 32 nm 40 nm • 45 nm 55 nm • 65 nm 80 nm • 90 nm 110 nm • 130 nm 150 nm • 180 nm 220 nm • 240 nm 250 nm • 280 nm 350 nm • 500 nm 600 nm • 650 nm 700 nm • 750 nm 800 nm 1 µm • 1.2 µm 1.3 µm • 1.5 µm 2 µm • 2.5 µm 3 µm • 3.5 µm 5 µm • 6 µm 7 µm • 8 µm 10 µm • 16 µm 20 µm • 50 µm

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The 80 nanometer (80 nm) lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 90 nm and 65 nm processes. Commercial integrated circuit manufacturing using 80 nm process began around 2004. This technology superseded by commercial 65 nm process by 2006.

Industry[edit]

80 nm Microprocessors[edit]

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80 nm System on Chips[edit]

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