The 110 nanometer (110 nm) lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 130 nm and 90 nm processes. 110 nm process was used in the early 2000s.

Industry

Fab
Process Name​
1st Production​
Type​
​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell

TSMC		UMC		On Semi
				SP110
2003
Bulk
Value	130 nm Δ	Value	130 nm Δ	Value	130 nm Δ
? nm	?x	? nm	?x	? nm	?x
? nm	?x	320 nm	?x	? nm	?x
? µm2	?x	? µm2	?x	? µm2	?x

110 nm Microprocessors

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