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From WikiChip
3 µm lithography process
Semiconductor lithography processes technology |
|
The 3 μm lithography process was the semiconductor process technology used by some semiconductor companies during the mid 1970s to the mid 1980s.
Industry
Fab |
---|
Process Name |
1st Production |
|
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
SRAM bit cell |
Hitachi |
---|
Hi-CMOS I |
? |
Value |
3 µm |
3 µm |
? µm² |
3 μm Microprocessors
- Intel
- Novix NC4016
- Dec
- Siemens
- Fairchild
- Toshiba
- National
- ARM
This list is incomplete; you can help by expanding it.
3 μm Microcontrollers
3 μm Chips
References
- Meguro, S., et al. "Hi-CMOS III technology." Electron Devices Meeting, 1984 International. IEEE, 1984.