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Difference between revisions of "7 µm lithography process"
(Created page with "{{Lithography processes}} The '''7μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This...") |
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|- style="text-align: center;" | |- style="text-align: center;" | ||
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|- style="text-align: center;" | |- style="text-align: center;" | ||
| 1970 | | 1970 |
Revision as of 07:17, 26 April 2016
Semiconductor lithography processes technology |
|
The 7μm lithography process was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by 6 µm, 6 µm, and 3 µm processes.
Industry
Fab |
---|
Process Name |
1st Production |
Contacted Gate Pitch |
Interconnect Pitch |
Metal Layers |
Technology |
Wafer |
HP |
---|
NMOS I |
1970 |
? nm |
? nm |
nMOS |
51 mm |
7μm chips
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