From WikiChip
Difference between revisions of "7 µm lithography process"

(Created page with "{{Lithography processes}} The '''7μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This...")
 
m (Industry)
Line 16: Line 16:
 
! [[HP]]
 
! [[HP]]
 
|- style="text-align: center;"
 
|- style="text-align: center;"
| nMOS I
+
| NMOS I
 
|- style="text-align: center;"
 
|- style="text-align: center;"
 
| 1970
 
| 1970

Revision as of 07:17, 26 April 2016

The 7μm lithography process was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by 6 µm, 6 µm, and 3 µm processes.

Industry

Fab
Process Name​
1st Production​
Contacted Gate Pitch​
Interconnect Pitch​
Metal Layers​
Technology​
Wafer
HP
NMOS I
1970
 ? nm
 ? nm
 
nMOS
51 mm

7μm chips

New text document.svg This section is empty; you can help add the missing info by editing this page.


Text document with shapes.svg This article is still a stub and needs your attention. You can help improve this article by editing this page and adding the missing information.