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Difference between revisions of "7 µm lithography process"
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− | The '''7μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by [[6 µm]], [[5 µm]], and [[3 | + | The '''7μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by [[6 µm]], [[5 µm]], and [[3 µm]] processes. |
== Industry == | == Industry == |
Latest revision as of 05:15, 18 January 2022
The 7μm lithography process was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by 6 µm, 5 µm, and 3 µm processes.
Industry[edit]
Fab |
---|
Process Name |
1st Production |
Contacted Gate Pitch |
Interconnect Pitch |
Metal Layers |
Technology |
Wafer |
HP |
---|
NMOS I |
1970 |
? nm |
? nm |
nMOS |
51 mm |
7μm chips[edit]
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