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Difference between revisions of "7 µm lithography process"

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{{Lithography processes}}
 
{{Lithography processes}}
The '''7μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by [[6 µm]], [[5 µm]], and [[3.5 µm]] processes.
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The '''7μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by [[6 µm]], [[5 µm]], and [[3 µm]] processes.
  
 
== Industry ==
 
== Industry ==

Latest revision as of 05:15, 18 January 2022

The 7μm lithography process was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by 6 µm, 5 µm, and 3 µm processes.

Industry[edit]

Fab
Process Name​
1st Production​
Contacted Gate Pitch​
Interconnect Pitch​
Metal Layers​
Technology​
Wafer
HP
NMOS I
1970
 ? nm
 ? nm
 
nMOS
51 mm

7μm chips[edit]

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