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Difference between revisions of "3 µm lithography process"
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** {{amd|2901}} | ** {{amd|2901}} | ||
− | + | == References == | |
− | + | * Meguro, S., et al. "Hi-CMOS III technology." Electron Devices Meeting, 1984 International. IEEE, 1984. | |
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[[Category:Lithography]] | [[Category:Lithography]] |
Revision as of 05:38, 4 April 2017
Semiconductor lithography processes technology |
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The 3 μm lithography process was the semiconductor process technology used by some semiconductor companies during the mid 1970s to the mid 1980s.
Industry
This section is empty; you can help add the missing info by editing this page. |
3 μm Microprocessors
- Intel
- Novix NC4016
- Dec
- Siemens
- Fairchild
- Toshiba
- National
- ARM
This list is incomplete; you can help by expanding it.
3 μm Microcontrollers
3 μm Chips
References
- Meguro, S., et al. "Hi-CMOS III technology." Electron Devices Meeting, 1984 International. IEEE, 1984.
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