Semiconductor & Computer Engineering
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Difference between revisions of "7 µm lithography process"
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{{Lithography processes}} | {{Lithography processes}} | ||
| − | The '''7μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by [[6 µm]], [[ | + | The '''7μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by [[6 µm]], [[5 µm]], and [[3 µm]] processes. |
== Industry == | == Industry == | ||
Latest revision as of 05:15, 18 January 2022
Semiconductor lithography processes technology
The 7μm lithography process was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by 6 µm, 5 µm, and 3 µm processes.
Industry[edit]
| Fab |
|---|
| Process Name |
| 1st Production |
| Contacted Gate Pitch |
| Interconnect Pitch |
| Metal Layers |
| Technology |
| Wafer |
| HP |
|---|
| NMOS I |
| 1970 |
| ? nm |
| ? nm |
| nMOS |
| 51 mm |
7μm chips[edit]
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