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Difference between revisions of "110 nm lithography process"
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| − | The '''110 nm lithography process''' is a [[technology node#half node|half-node]] semiconductor manufacturing process used as a stopgap between the [[130 nm lithography process|130 nm]] and [[90 nm lithography process|90 nm]] processes. 110 nm process was used in the early 2000s. | + | The '''110 nanometer (110 nm) lithography process''' is a [[technology node#half node|half-node]] semiconductor manufacturing process used as a stopgap between the [[130 nm lithography process|130 nm]] and [[90 nm lithography process|90 nm]] processes. 110 nm process was used in the early 2000s. |
== Industry == | == Industry == | ||
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== 110 nm Microprocessors== | == 110 nm Microprocessors== | ||
{{expand list}} | {{expand list}} | ||
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| + | [[category:lithography]] | ||
Latest revision as of 04:57, 20 July 2018
Semiconductor lithography processes technology
The 110 nanometer (110 nm) lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 130 nm and 90 nm processes. 110 nm process was used in the early 2000s.
Industry[edit]
| Fab |
|---|
| Process Name |
| 1st Production |
| Type |
| |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| SRAM bit cell |
| TSMC | UMC | On Semi | |||
|---|---|---|---|---|---|
| SP110 | |||||
| 2003 | |||||
| Bulk | |||||
| Value | 130 nm Δ | Value | 130 nm Δ | Value | 130 nm Δ |
| ? nm | ?x | ? nm | ?x | ? nm | ?x |
| ? nm | ?x | 320 nm | ?x | ? nm | ?x |
| ? µm2 | ?x | ? µm2 | ?x | ? µm2 | ?x |
110 nm Microprocessors[edit]
This list is incomplete; you can help by expanding it.