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Difference between revisions of "Template:lithography processes"
(Added some of the newer missing lithographic processes (not that it matters much at this point since they are all going to be redlinks)) |
(added final node 1nm) |
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<div class="noprint" style="float:right; box-shadow: 0 0 4px #BDBDBD inset; background-color: #FFFFFF; border-radius: 5px; width:150px; padding:10px; margin-left: 10px; margin-bottom: 15px;"> | <div class="noprint" style="float:right; box-shadow: 0 0 4px #BDBDBD inset; background-color: #FFFFFF; border-radius: 5px; width:150px; padding:10px; margin-left: 10px; margin-bottom: 15px;"> | ||
{| cellspacing="0" | {| cellspacing="0" | ||
− | | style="width: 150px; text-align: center; font-size: 10px; font-weight: bold; color: #4A98D9;" | | + | | style="width: 150px; text-align: center; font-size: 10px; font-weight: bold; color: #4A98D9;" | [[File:basic wafer drawing.svg|link=|75px|class=wikichip_ogimage]] Semiconductor lithography processes technology |
− | Semiconductor lithography processes technology | ||
|- | |- | ||
| style="padding-left: 10px;" | | | style="padding-left: 10px;" | | ||
− | :* [[ | + | :* [[1 nm lithography process|1 nm]] |
− | :* [[ | + | :* [[2 nm lithography process|2 nm]] |
− | :* [[ | + | :* [[3 nm lithography process|3 nm]] |
− | :* [[ | + | :* [[5 nm lithography process|5 nm]] |
− | :* [[ | + | :* [[7 nm lithography process|7 nm]] |
− | :* [[ | + | :* [[10 nm lithography process|10 nm]] |
− | :* [[ | + | :* [[14 nm lithography process|14 nm]] |
− | :* [[ | + | :* [[16 nm lithography process|16 nm]] |
− | :* [[ | + | :* [[20 nm lithography process|20 nm]] |
− | :* [[ | + | :* [[22 nm lithography process|22 nm]] |
− | :* [[ | + | :* [[28 nm lithography process|28 nm]] |
− | :* [[ | + | :* [[32 nm lithography process|32 nm]] |
− | :* [[ | + | :* [[40 nm lithography process|40 nm]] |
− | :* [[ | + | :* [[45 nm lithography process|45 nm]] |
− | :* [[ | + | :* [[55 nm lithography process|55 nm]] |
− | :* [[ | + | :* [[65 nm lithography process|65 nm]] |
− | :* [[ | + | :* [[80 nm lithography process|80 nm]] |
− | :* [[ | + | :* [[90 nm lithography process|90 nm]] |
− | :* [[ | + | :* [[110 nm lithography process|110 nm]] |
− | :* [[ | + | :* [[130 nm lithography process|130 nm]] |
− | :* [[ | + | :* [[150 nm lithography process|150 nm]] |
− | :* [[ | + | :* [[180 nm lithography process|180 nm]] |
− | :* [[ | + | :* [[220 nm lithography process|220 nm]] |
− | :* [[ | + | :* [[240 nm lithography process|240 nm]] |
− | :* [[ | + | :* [[250 nm lithography process|250 nm]] |
− | :* [[ | + | :* [[280 nm lithography process|280 nm]] |
− | :* [[ | + | :* [[350 nm lithography process|350 nm]] |
− | :* [[ | + | :* [[500 nm lithography process|500 nm]] |
− | :* [[ | + | :* [[600 nm lithography process|600 nm]] |
− | :* [[ | + | :* [[650 nm lithography process|650 nm]] |
− | :* [[ | + | :* [[700 nm lithography process|700 nm]] |
− | :* [[ | + | :* [[750 nm lithography process|750 nm]] |
− | :* [[ | + | :* [[800 nm lithography process|800 nm]] |
− | :* [[ | + | :* [[1 µm lithography process|1 µm]] |
− | |} | + | :* [[1.2 µm lithography process|1.2 µm]] |
− | {{Navbar|Template: | + | :* [[1.3 µm lithography process|1.3 µm]] |
+ | :* [[1.5 µm lithography process|1.5 µm]] | ||
+ | :* [[2 µm lithography process|2 µm]] | ||
+ | :* [[2.5 µm lithography process|2.5 µm]] | ||
+ | :* [[3 µm lithography process|3 µm]] | ||
+ | :* [[3.5 µm lithography process|3.5 µm]] | ||
+ | :* [[5 µm lithography process|5 µm]] | ||
+ | :* [[6 µm lithography process|6 µm]] | ||
+ | :* [[7 µm lithography process|7 µm]] | ||
+ | :* [[8 µm lithography process|8 µm]] | ||
+ | :* [[10 µm lithography process|10 µm]] | ||
+ | :* [[16 µm lithography process|16 µm]] | ||
+ | :* [[20 µm lithography process|20 µm]] | ||
+ | :* [[50 µm lithography process|50 µm]] | ||
+ | |}{{Navbar|Template:lithography processes|text=|mini=1|style=float:right;}} | ||
</div> | </div> | ||
<noinclude> | <noinclude> | ||
[[Category:Lithography]] | [[Category:Lithography]] | ||
</noinclude> | </noinclude> |