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Difference between revisions of "7 µm lithography process"
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| − | The '''7μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by [[6 µm]], [[ | + | The '''7μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by [[6 µm]], [[5 µm]], and [[3.5 µm]] processes. |
== Industry == | == Industry == | ||
Revision as of 05:15, 18 January 2022
The 7μm lithography process was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by 6 µm, 5 µm, and 3.5 µm processes.
Industry
| Fab |
|---|
| Process Name |
| 1st Production |
| Contacted Gate Pitch |
| Interconnect Pitch |
| Metal Layers |
| Technology |
| Wafer |
| HP |
|---|
| NMOS I |
| 1970 |
| ? nm |
| ? nm |
| nMOS |
| 51 mm |
7μm chips
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