From WikiChip
Difference between revisions of "Template:lithography processes"

(changed greek mu to micro symbol, added space)
Line 5: Line 5:
 
|-
 
|-
 
| style="padding-left: 10px;" |
 
| style="padding-left: 10px;" |
 +
:* [[50 µm lithography process|50 µm]]
 +
:* [[20 µm lithography process|20 µm]]
 
:* [[10 µm lithography process|10 µm]]
 
:* [[10 µm lithography process|10 µm]]
 
:* [[8 µm lithography process|8 µm]]
 
:* [[8 µm lithography process|8 µm]]

Revision as of 16:49, 13 April 2016