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Difference between revisions of "Template:lithography processes"
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− | :* [[ | + | :* [[10 µm lithography process|10 µm]] |
− | :* [[ | + | :* [[8 µm lithography process|8 µm]] |
− | :* [[ | + | :* [[6 µm lithography process|6 µm]] |
− | :* [[ | + | :* [[5 µm lithography process|5 µm]] |
− | :* [[3. | + | :* [[3.5 µm lithography process|3.5 µm]] |
− | :* [[ | + | :* [[3 µm lithography process|3 µm]] |
− | :* [[ | + | :* [[2 µm lithography process|2 µm]] |
− | :* [[1. | + | :* [[1.5 µm lithography process|1.5 µm]] |
− | :* [[ | + | :* [[1 µm lithography process|1 µm]] |
− | :* [[ | + | :* [[800 nm lithography process|800 nm]] |
− | :* [[ | + | :* [[600 nm lithography process|600 nm]] |
− | :* [[ | + | :* [[500 nm lithography process|500 nm]] |
− | :* [[ | + | :* [[350 nm lithography process|350 nm]] |
− | :* [[ | + | :* [[250 nm lithography process|250 nm]] |
− | :* [[ | + | :* [[220 nm lithography process|220 nm]] |
− | :* [[ | + | :* [[180 nm lithography process|180 nm]] |
− | :* [[ | + | :* [[150 nm lithography process|150 nm]] |
− | :* [[ | + | :* [[130 nm lithography process|130 nm]] |
− | :* [[ | + | :* [[110 nm lithography process|110 nm]] |
− | :* [[ | + | :* [[90 nm lithography process|90 nm]] |
− | :* [[ | + | :* [[80 nm lithography process|80 nm]] |
− | :* [[ | + | :* [[65 nm lithography process|65 nm]] |
− | :* [[ | + | :* [[45 nm lithography process|45 nm]] |
− | :* [[ | + | :* [[40 nm lithography process|40 nm]] |
− | :* [[ | + | :* [[32 nm lithography process|32 nm]] |
− | :* [[ | + | :* [[28 nm lithography process|28 nm]] |
− | :* [[ | + | :* [[22 nm lithography process|22 nm]] |
− | :* [[ | + | :* [[14 nm lithography process|14 nm]] |
− | :* [[ | + | :* [[10 nm lithography process|10 nm]] |
− | :* [[ | + | :* [[7 nm lithography process|7 nm]] |
− | :* [[ | + | :* [[5 nm lithography process|5 nm]] |
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{{Navbar|Template:Lithography processes|text=|mini=1|style=float:right;}} | {{Navbar|Template:Lithography processes|text=|mini=1|style=float:right;}} |