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Difference between revisions of "Template:lithography processes"

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:* [[10μm lithography process|10μm]]
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:* [[10 µm lithography process|10 µm]]
:* [[8μm lithography process|8μm]]
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:* [[8 µm lithography process|8 µm]]
:* [[6μm lithography process|6μm]]
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:* [[6 µm lithography process|6 µm]]
:* [[5μm lithography process|5μm]]
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:* [[5 µm lithography process|5 µm]]
:* [[3.5μm lithography process|3.5μm]]
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:* [[3.5 µm lithography process|3.5 µm]]
:* [[3μm lithography process|3μm]]
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:* [[3 µm lithography process|3 µm]]
:* [[2μm lithography process|2μm]]
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:* [[2 µm lithography process|2 µm]]
:* [[1.5μm lithography process|1.5μm]]
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:* [[1.5 µm lithography process|1.5 µm]]
:* [[1μm lithography process|1μm]]
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:* [[1 µm lithography process|1 µm]]
:* [[800nm lithography process|800nm]]
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:* [[800 nm lithography process|800 nm]]
:* [[600nm lithography process|600nm]]
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:* [[600 nm lithography process|600 nm]]
:* [[500nm lithography process|500nm]]
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:* [[500 nm lithography process|500 nm]]
:* [[350nm lithography process|350nm]]
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:* [[350 nm lithography process|350 nm]]
:* [[250nm lithography process|250nm]]
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:* [[250 nm lithography process|250 nm]]
:* [[220nm lithography process|220nm]]
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:* [[220 nm lithography process|220 nm]]
:* [[180nm lithography process|180nm]]
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:* [[180 nm lithography process|180 nm]]
:* [[150nm lithography process|150nm]]
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:* [[150 nm lithography process|150 nm]]
:* [[130nm lithography process|130nm]]
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:* [[130 nm lithography process|130 nm]]
:* [[110nm lithography process|110nm]]
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:* [[110 nm lithography process|110 nm]]
:* [[90nm lithography process|90nm]]
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:* [[90 nm lithography process|90 nm]]
:* [[80nm lithography process|80nm]]
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:* [[80 nm lithography process|80 nm]]
:* [[65nm lithography process|65nm]]
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:* [[65 nm lithography process|65 nm]]
:* [[45nm lithography process|45nm]]
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:* [[45 nm lithography process|45 nm]]
:* [[40nm lithography process|40nm]]
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:* [[40 nm lithography process|40 nm]]
:* [[32nm lithography process|32nm]]
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:* [[32 nm lithography process|32 nm]]
:* [[28nm lithography process|28nm]]
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:* [[28 nm lithography process|28 nm]]
:* [[22nm lithography process|22nm]]
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:* [[22 nm lithography process|22 nm]]
:* [[14nm lithography process|14nm]]
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:* [[14 nm lithography process|14 nm]]
:* [[10nm lithography process|10nm]]
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:* [[10 nm lithography process|10 nm]]
:* [[7nm lithography process|7nm]]
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:* [[7 nm lithography process|7 nm]]
:* [[5nm lithography process|5nm]]
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:* [[5 nm lithography process|5 nm]]
 
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{{Navbar|Template:Lithography processes|text=|mini=1|style=float:right;}}
 
{{Navbar|Template:Lithography processes|text=|mini=1|style=float:right;}}

Revision as of 00:51, 29 March 2016