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Process Technology - Intel
This article details Intel's Semiconductor Process Technology.
Timeline
Year | Process | Node | MLayers | µarchs | Transistor | Attributes | ||||
---|---|---|---|---|---|---|---|---|---|---|
CHMOS I | 3 µm | 1 | Tox | 70 nm | Gate Dielectric | |||||
Vdd | 5 V | SRAM | 1120 µm² | |||||||
Lg | 3.0 µm | |||||||||
CPP | 7 µm | MMP | 11 µm | |||||||
CHMOS II | 2 µm | 1 | Tox | 40 nm | Gate Dielectric | |||||
Vdd | 5 V | SRAM (HD) | 1740 µm² | |||||||
Lg | 2.0 µm | |||||||||
CPP | 5.6 µm | MMP | 8 µm | |||||||
1982 | P646 (CHMOS III) | 1.5 µm | 1 | 80286, 80386 |
Tox | 25 nm | Gate Dielectric | Si2N2O | ||
Vdd | 5 V | SRAM (HD) | 951.7 µm² | |||||||
Lg | 1.5 µm | |||||||||
CPP | 4.0 µm | MMP | 6.4 µm | |||||||
1987 | P648 | 1.0 µm | 2 | 80486 | Lg | 1,000 nm | ||||
Tox | ? nm | Gate Dielectric | ||||||||
Vdd | ? V | |||||||||
1989 | P650 | 0.8 µm | 3 | 80486 | Lg | 800 nm | ||||
Tox | ? nm | Gate Dielectric | ||||||||
Vdd | ? V | |||||||||
1993 | P852 | 0.5 µm | 4 | P5 | Lg | 500 nm | ||||
Tox | 8.0 nm | Gate Dielectric | ||||||||
Vdd | 3.3 V | |||||||||
1995 | P854 | 0.35 µm | 4 | P6 | Lg | 350 nm | ||||
Tox | 5.2 nm | Gate Dielectric | ||||||||
Vdd | 2.5 V | |||||||||
1997 | P856 P856.5 |
0.25 µm | 5 | P6 | Lg | 200 nm | ||||
Tox | 3.1 nm | Gate Dielectric | SiO2 | |||||||
Vdd | 1.8 V | |||||||||
1999 | P858 | 0.18 µm | 6 | NetBurst | Lg | 130 nm | ||||
Tox | 2.0 nm | Gate Dielectric | SiO2 | |||||||
Vdd | 1.6 V | |||||||||
2001 | P860 | 0.13 µm | 6 | Pentium M | Lg | 70 nm | ||||
Tox | 1.4 nm | Gate Dielectric | SiO2 | |||||||
Vdd | 1.4 V | |||||||||
SRAM (HD) | 2.45 µm² | |||||||||
2003 | P1262 | 90 nm | 7 | Pentium M | Lg | 50 nm | ||||
Tox | 1.2 nm | Gate Dielectric | SiO2 | |||||||
Vdd | 1.2 V | |||||||||
SRAM (HD) | 1.00 µm² | |||||||||
2005 | P1264 | 65 nm | 8 | Core, Modified Pentium M |
Tox | Gate Dielectric | SiO2 | |||
Vdd | SRAM | 0.570 µm² | ||||||||
Lg | 35 nm | |||||||||
CPP | 220 nm | MMP | 210 nm | |||||||
2007 | P1266 | 45 nm | 9 | Penryn, Nehalem |
Tox | Gate Dielectric | High-κ | |||
Vdd | SRAM | 0.346 µm² | ||||||||
Lg | 25 nm | |||||||||
CPP | 160 nm | MMP | 180 nm | |||||||
2009 | P1268 | 32 nm | 10 | Westmere, Sandy Bridge |
Tox | Gate Dielectric | High-κ | |||
Vdd | SRAM | 0.148 µm² | ||||||||
Lg | 30 nm | |||||||||
CPP | 112.5 nm | MMP | 112.5 nm | |||||||
2011 | P1270 | 22 nm | 11 | Ivy Bridge, Haswell |
Tox | Gate Dielectric | High-κ | |||
Vdd | SRAM | 0.092 µm² | ||||||||
Lg | 26 nm | |||||||||
CPP | 90 nm | MMP | 80 nm | |||||||
2014 | P1272 | 14 nm | 11 | Broadwell, Skylake, Kaby Lake, Coffee Lake |
Tox | Gate Dielectric | High-κ | |||
Vdd | SRAM | 0.0499 µm² | ||||||||
Lg | 20 nm | |||||||||
CPP | 70 nm | MMP | 52 nm | |||||||
2017 | P1274 | 10 nm | Cannonlake, Icelake, Tigerlake |
Tox | Gate Dielectric | High-κ | ||||
Vdd | SRAM | 0.0312 µm² | ||||||||
Lg | 18 nm ? | |||||||||
CPP | 54 nm | MMP | 36 nm | |||||||
2019 | P1276 | 7 nm | ||||||||
2022 | P1278 | 5 nm |