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Nehalem - Microarchitectures - Intel
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Nehalem µarch
General Info
Arch TypeCPU
DesignerIntel
ManufacturerIntel
IntroductionAugust, 2008
Phase-outMarch, 2010
Process45 nm
Succession

Nehalem was the microarchitecture for Intel's 45 nm process for desktops and servers as a successor to Penryn. Nehalem is named after the Nehalem River. Nehalem was replaced by the Westmere microarchitecture in 2010.

Nehalem wafer

Process Technology[edit]

45 nm Manufacturing Fabs
Fab Location
D1D Hillsboro, Oregon
Fab 32 Chandler, Arizona
Fab 28 Kiryat Gat, Israel

Penryn-based microprocessors were manufactured on a 45 nm process. Intel's 45 nm process is the is the first high-volume manufacturing process to introduce High-k + metal gate transistors.

Scaling:

Core Nehalem Δ intel 45nm gate.png
65 nm 45 nm
Metal Layers 8 9
Gate Pitch 220 nm 180 nm 0.82x
Interconnect Pitch 210 nm 160 nm 0.76x
SRAM bit cell​ (HD) 0.570 µm² 0.346 um² 0.61x
SRAM bit cell​ (LP) 0.680 µm² 0.382 um² 0.56x

Die Shot[edit]

Bloomfield[edit]

nehalem die shot.png


Lynfield[edit]

intel nehalem lynfield die shot.jpg


Nehalem-EX[edit]

intel Nehalem-EX die shot.jpeg
codenameNehalem +
designerIntel +
first launchedAugust 2008 +
full page nameintel/microarchitectures/nehalem +
instance ofmicroarchitecture +
manufacturerIntel +
microarchitecture typeCPU +
nameNehalem +
phase-outMarch 2010 +
process45 nm (0.045 μm, 4.5e-5 mm) +