From WikiChip
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- 19:13, 28 January 2019 (diff | hist) . . (+90) . . chiplet
- 19:11, 28 January 2019 (diff | hist) . . (+76) . . N File:chiplet design.svg (chiplet-based design.) (current)
- 16:15, 28 January 2019 (diff | hist) . . (+441) . . chiplet (→Motivation)
- 16:10, 28 January 2019 (diff | hist) . . (+28) . . N D0 (Redirected page to defect density) (current)
- 16:10, 28 January 2019 (diff | hist) . . (+1,284) . . chiplet
- 16:08, 28 January 2019 (diff | hist) . . (+118) . . N File:monolithic design vs chiplet yield.png (Yield for monolithic design vs chiplets for a D0 = 0.1.) (current)
- 14:42, 28 January 2019 (diff | hist) . . (+43) . . defect density (current)
- 13:09, 28 January 2019 (diff | hist) . . (+129) . . N File:amd iedm 2017 dr lisa su keynote 7nm cost.png (IEDM 2017 AMD Dr. Lisa Su keynote. Cost per yielded mm2 for a 250mm2 die.) (current)
- 13:01, 28 January 2019 (diff | hist) . . (+718) . . chiplet
- 12:23, 28 January 2019 (diff | hist) . . (+9) . . defect density
- 05:27, 28 January 2019 (diff | hist) . . (+262) . . N critical area (ca) (current)
- 05:27, 28 January 2019 (diff | hist) . . (+92) . . Template:yield (current)
- 05:21, 28 January 2019 (diff | hist) . . (+277) . . defect density
- 04:50, 28 January 2019 (diff | hist) . . (+9) . . yield
- 04:50, 28 January 2019 (diff | hist) . . (+754) . . N Template:yield (Created page with "<table class="guidebox"> <tr><td colspan="2">{{Navbar|Template:yield|text=|mini=1|style=float:left;}}</td></tr> <tr><td class="header-main" colspan="2">Yield</td></tr> <tr><td...")
- 04:49, 28 January 2019 (diff | hist) . . (0) . . File:wafer yield.svg (David uploaded a new version of File:wafer yield.svg) (current)
- 04:46, 28 January 2019 (diff | hist) . . (+89) . . N File:wafer yield.svg (wafer yield image by WikiChip.)
- 04:35, 28 January 2019 (diff | hist) . . (+28) . . N Defect density (Redirected page to defect density) (current)
- 04:35, 28 January 2019 (diff | hist) . . (+28) . . N Defect Density (Redirected page to defect density) (current)
- 04:35, 28 January 2019 (diff | hist) . . (0) . . m defect density (David moved page d0 to defect density)
- 04:35, 28 January 2019 (diff | hist) . . (+28) . . N d0 (David moved page d0 to defect density) (current)
- 04:34, 28 January 2019 (diff | hist) . . (+189) . . N defect density (d0)
- 04:15, 28 January 2019 (diff | hist) . . (+19) . . N Yield (Redirected page to yield) (current)
- 04:00, 28 January 2019 (diff | hist) . . (+202) . . yield (→Yield loss)
- 03:55, 28 January 2019 (diff | hist) . . (+905) . . yield
- 03:32, 28 January 2019 (diff | hist) . . (+496) . . N yield (yield)
- 02:33, 28 January 2019 (diff | hist) . . (+129) . . WikiChip:chip feed
- 02:31, 28 January 2019 (diff | hist) . . (+1) . . WikiChip:chip feed
- 01:40, 28 January 2019 (diff | hist) . . (+222) . . self-aligned contact (→Overview)
- 01:35, 28 January 2019 (diff | hist) . . (+87) . . N File:sac cap.svg (self-aligned contact capacitance) (current)
- 01:12, 28 January 2019 (diff | hist) . . (+540) . . self-aligned contact (→Industry)
- 00:54, 28 January 2019 (diff | hist) . . (+134) . . N File:intel 22nm sac yield improvement.png (Intel 22 nm process yield improvement due to SAC and contact misalignment.) (current)
- 00:04, 28 January 2019 (diff | hist) . . (+9) . . self-aligned contact (→Intel)
- 21:24, 27 January 2019 (diff | hist) . . (+293) . . self-aligned contact (→Intel)
- 21:21, 27 January 2019 (diff | hist) . . (+121) . . N File:intel 22nm sac.png (Intel 22 nm process self-aligned contact. Image by Intel.) (current)
- 21:20, 27 January 2019 (diff | hist) . . (+144) . . N File:intel 22nm sac (annotated).png (Intel 22 nm process self-aligned contact. Image by Intel. Annotated by WikiChip.) (current)
- 03:29, 27 January 2019 (diff | hist) . . (+803) . . self-aligned contact
- 03:26, 27 January 2019 (diff | hist) . . (+76) . . N File:cpp sac flow.svg (Intel's SAC flow.) (current)
- 02:51, 27 January 2019 (diff | hist) . . (+43) . . self-aligned contact (→Overview)
- 02:50, 27 January 2019 (diff | hist) . . (+93) . . N File:cpp scaling with sac.svg (CPP scaling with self-aligned contact.) (current)
- 02:43, 27 January 2019 (diff | hist) . . (+35) . . self-aligned contact (→Overview)
- 02:42, 27 January 2019 (diff | hist) . . (0) . . File:cpp scaling.svg (David uploaded a new version of File:cpp scaling.svg) (current)
- 02:41, 27 January 2019 (diff | hist) . . (+84) . . N File:cpp scaling.svg (contacted poly pitch scaling.)
- 02:35, 27 January 2019 (diff | hist) . . (+1,524) . . self-aligned contact
- 02:26, 27 January 2019 (diff | hist) . . (+31) . . N Category:front-end-of-line device fabrication (Created page with "Category:device fabrication") (current)
- 01:08, 27 January 2019 (diff | hist) . . (+34) . . N SAC (Redirected page to self-aligned contact) (current)
- 01:08, 27 January 2019 (diff | hist) . . (+34) . . N self aligned contact (Redirected page to self-aligned contact) (current)
- 01:07, 27 January 2019 (diff | hist) . . (+411) . . N self-aligned contact (Created page with "{{title|Self-Aligned Contact (SAC)}} '''Self-Aligned Contact''' ('''SAC''') is a semiconductor process flow technique that adds a protective dielectric layer over the tr...")
- 00:32, 27 January 2019 (diff | hist) . . (+129) . . intel/process (→Timeline)
- 00:28, 27 January 2019 (diff | hist) . . (+99) . . N File:intel scaling roadmap to 5nm.png (Intel {{intel|Process}} scaling to 5nm.) (current)
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