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Nehalem µarch
General Info
Arch Type	CPU
Designer	Intel
Manufacturer	Intel
Introduction	August, 2008
Phase-out	March, 2010
Process	45 nm
Succession
Penryn Westmere

Nehalem was the microarchitecture for Intel's 45 nm process for desktops and servers as a successor to Penryn. Nehalem is named after the Nehalem River. Nehalem was replaced by the Westmere microarchitecture in 2010.

Nehalem wafer

Process Technology

45 nm Manufacturing Fabs
Fab	Location
D1D	Hillsboro, Oregon
Fab 32	Chandler, Arizona
Fab 28	Kiryat Gat, Israel

Penryn-based microprocessors were manufactured on a 45 nm process. Intel's 45 nm process is the is the first high-volume manufacturing process to introduce High-k + metal gate transistors.

Scaling:

	Core	Nehalem	Δ
	65 nm	45 nm
Metal Layers	8	9
Gate Pitch	220 nm	180 nm	0.82x
Interconnect Pitch	210 nm	160 nm	0.76x
SRAM bit cell​ (HD)	0.570 µm²	0.346 um²	0.61x
SRAM bit cell​ (LP)	0.680 µm²	0.382 um²	0.56x

Die Shot

Bloomfield

• 263 mm²
• 713,000,000 transistors
• 45 nm process
• 4 cores

Lynfield

• 296 mm²
• 774,000,000 transistors
• 45 nm process
• 4 cores

Nehalem-EX

• 648 mm²
• 2.300,000,000 transistors
• 45 nm process
• 8 cores