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{{intel title|Nehalem|arch}}
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{{microarchitecture
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| atype            = CPU
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| name            = Nehalem
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| designer        = Intel
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| manufacturer    = Intel
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| introduction    = August, 2008
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| phase-out        = March, 2010
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| process          = 45 nm
  
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| succession      = Yes
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| predecessor      = Penryn
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| predecessor link = intel/microarchitectures/penryn
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| successor        = Westmere
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| successor link  = intel/microarchitectures/westmere
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}}
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'''Nehalem''' was the [[microarchitecture]] for [[Intel]]'s [[45 nm process]] for desktops and servers as a successor to {{\\|Penryn}}. Nehalem is named after the [[wikipedia:Nehalem River|Nehalem River]]. Nehalem was replaced by the {{\\|Westmere}} microarchitecture in 2010.
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[[File:Nehalem.jpg|right|thumb|300px|Nehalem wafer]]
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== Process Technology ==
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{| class="wikitable" style="float: right;"
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! colspan="2" | 45 nm Manufacturing Fabs
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|-
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! Fab !! Location
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|-
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| D1D || Hillsboro, Oregon
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|-
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| Fab 32 || Chandler, Arizona
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|-
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| Fab 28 || Kiryat Gat, Israel
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|}
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Penryn-based [[microprocessors]] were manufactured on a [[45 nm process]]. Intel's 45 nm process is the is the first high-volume manufacturing process to introduce High-k + metal gate transistors.
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Scaling:
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{| class="wikitable"
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|-
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! !! Core !! Nehalem !! Δ !! rowspan="7" | [[File:intel 45nm gate.png|250px]]
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|-
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| || [[65 nm]] || [[45 nm]] ||
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|-
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| Metal Layers || 8 || 9 ||
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|-
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| Gate Pitch || 220 nm || 180 nm || 0.82x
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|-
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| Interconnect Pitch || 210 nm || 160 nm || 0.76x
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|-
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| SRAM bit cell​ (HD) || 0.570 µm² || 0.346 um² || 0.61x
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|-
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| SRAM bit cell​ (LP) || 0.680 µm² || 0.382 um² || 0.56x
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|}
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== Die Shot ==
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===Bloomfield===
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* 263 mm²
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* 713,000,000 transistors
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* [[45 nm process]]
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* 4 cores
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: [[File:nehalem die shot.png|700px]]
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===Lynfield===
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* 296 mm²
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* 774,000,000 transistors
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* [[45 nm process]]
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* 4 cores
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: [[File:intel nehalem lynfield die shot.jpg|700px]]
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===Nehalem-EX===
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* 648 mm²
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* 2.300,000,000 transistors
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* [[45 nm process]]
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* 8 cores
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: [[File:intel Nehalem-EX die shot.jpeg|700px]]

Revision as of 05:39, 26 October 2017

Edit Values
Nehalem µarch
General Info
Arch TypeCPU
DesignerIntel
ManufacturerIntel
IntroductionAugust, 2008
Phase-outMarch, 2010
Process45 nm
Succession

Nehalem was the microarchitecture for Intel's 45 nm process for desktops and servers as a successor to Penryn. Nehalem is named after the Nehalem River. Nehalem was replaced by the Westmere microarchitecture in 2010.

Nehalem wafer

Process Technology

45 nm Manufacturing Fabs
Fab Location
D1D Hillsboro, Oregon
Fab 32 Chandler, Arizona
Fab 28 Kiryat Gat, Israel

Penryn-based microprocessors were manufactured on a 45 nm process. Intel's 45 nm process is the is the first high-volume manufacturing process to introduce High-k + metal gate transistors.

Scaling:

Core Nehalem Δ intel 45nm gate.png
65 nm 45 nm
Metal Layers 8 9
Gate Pitch 220 nm 180 nm 0.82x
Interconnect Pitch 210 nm 160 nm 0.76x
SRAM bit cell​ (HD) 0.570 µm² 0.346 um² 0.61x
SRAM bit cell​ (LP) 0.680 µm² 0.382 um² 0.56x

Die Shot

Bloomfield

nehalem die shot.png


Lynfield

intel nehalem lynfield die shot.jpg


Nehalem-EX

intel Nehalem-EX die shot.jpeg
Retrieved from "https://en.wikichip.org/w/index.php?title=intel/microarchitectures/nehalem_(client)&oldid=66278"
Facts about "Nehalem - Microarchitectures - Intel"
RDF feed
codenameNehalem +
designerIntel +
first launchedAugust 2008 +
full page nameintel/microarchitectures/nehalem (client) +
instance ofmicroarchitecture +
manufacturerIntel +
microarchitecture typeCPU +
nameNehalem +
phase-outMarch 2010 +
process45 nm (0.045 μm, 4.5e-5 mm) +