From WikiChip
Search results

  • ...fet|MOS]] [[transistor]]s - [[pmos transistor|pMOS]] and [[pMOS transistor|nMOS]]. CMOS is the dominant technology used for [[VLSI]] and [[ULSI]] circuit ...S]] and [[nMOS transistor|nMOS]]. To better understand this, consider an [[nMOS transistor]]. Because it can pull no higher than V<sub>DD</sub> - V<sub>t</
    7 KB (1,159 words) - 21:01, 8 February 2019
  • ...ors are cascaded with an [[NPN transistor]]. When the input is HIGH, the [[NMOS transitor]] is conducting becoming the base current for the Q<sub>2</sub> N
    2 KB (329 words) - 08:33, 16 January 2019
  • ...removing redundant sets of [[pMOS transistor|pMOS]] and [[nMOS transistor|nMOS]] pairs of [[transistor]]s.
    903 bytes (132 words) - 00:34, 8 December 2015
  • *** [[nmos logic|n-type metal–oxide–semiconductor logic]] (nMOS)
    1 KB (145 words) - 00:40, 26 December 2015
  • | tech 2 = nMOS ...OS logic|pMOS]] technology, TI later expended the family into [[nMOS logic|nMOS]] and [[CMOS]].
    6 KB (711 words) - 04:39, 26 April 2017
  • | tech = nMOS
    1 KB (121 words) - 22:16, 16 January 2016
  • | tech = nMOS ...1975. The chipset was manufactured by [[Western Digital]] in [[nMOS logic|nMOS]] technology under a $6.3M contract<ref>{{apa mag|month=February|day=26|yea
    2 KB (253 words) - 00:33, 19 May 2016
  • | tech = nMOS
    1 KB (148 words) - 01:04, 19 May 2016
  • | tech = nMOS
    3 KB (423 words) - 00:33, 19 May 2016
  • | tech = nMOS
    1 KB (114 words) - 05:27, 22 January 2016
  • | tech = nMOS
    2 KB (233 words) - 15:20, 3 February 2016
  • | tech = nMOS ...designed by [[Toshiba]] during the late 1970s. The [[microprocessor]] uses nMOS technology and was primarily used in very low-end controllers.
    1 KB (146 words) - 11:49, 23 May 2021
  • | tech = nMOS
    5 KB (683 words) - 23:46, 7 March 2018
  • | tech = nMOS
    2 KB (172 words) - 17:18, 12 December 2016
  • | tech = nMOS
    4 KB (406 words) - 16:10, 26 January 2019
  • ...[[Intel]]'s 2nd generation FinFET transistors. Intel uses TiN pMOS / TiAlN nMOS as work function metals. Intel makes use of 193 nm immersion lithography wi ...irst generation of FinFET-based transistors. Samsung uses TiN pMOS / TiAIC nMOS as work function metals. Samsung node has gone through a number of refineme
    17 KB (2,243 words) - 19:32, 25 May 2023
  • [[File:intel 14nm+ (nmos).png|400px]]
    38 KB (5,431 words) - 10:41, 8 April 2024
  • | NMOS I | nMOS
    710 bytes (91 words) - 06:15, 18 January 2022
  • ...ng density. Loveland went on on to create a third and final process, the ''NMOS III'' using a [[1.5 µm process]]. While they succeeded in doubling the den | fab 1 xtor.tech = nMOS
    2 KB (325 words) - 06:22, 20 July 2018
  • | nMOS || nMOS || nMOS
    1 KB (122 words) - 06:21, 20 July 2018

View (previous 20 | next 20) (20 | 50 | 100 | 250 | 500)