Information for "10 nm lithography process"

Basic information

Display title	10 nm lithography process
Default sort key	10 nm lithography process
Page length (in bytes)	14,612
Page ID	6917
Page content language	English (en)
Page content model	wikitext
Indexing by robots	Allowed
Number of redirects to this page	21
Counted as a content page	Yes
Number of subpages of this page	0 (0 redirects; 0 non-redirects)

Edit	Allow all users (infinite)
Move	Allow all users (infinite)

Page creator	David (talk \| contribs)
Date of page creation	21:46, 23 April 2016
Latest editor	David (talk \| contribs)
Date of latest edit	06:52, 17 February 2023
Total number of edits	128
Total number of distinct authors	24
Recent number of edits (within past 90 days)	0
Recent number of distinct authors	0

Transcluded templates (16)	Templates used on this page: Template:10 nm comp (edit) Template:10 nm comp header (edit) Template:Navbar (edit) Template:clear (edit) Template:expand list (edit) Template:finfet nodes comp (edit) Template:intel (view source) (protected) Template:link-intel (view source) (protected) Template:link-qualcomm (edit) Template:link-samsung (edit) Template:lithography processes (edit) Template:qualcomm (edit) Template:samsung (edit) Template:see also (edit) Template:url parse anchor (view source) (protected) Template:url parse article (view source) (protected)