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  • 250 nm lithography process
    * Seshan, Krishna, Timothy J. Maloney, and Kenneth J. Wu. "The quality and reliability of Intel's quar
    6 KB (661 words) - 15:18, 21 August 2022
  • uc davis/kilocore
    * Brent Bohnenstiehl, Aaron Stillmaker, Jon Pimentel, Timothy Andreas, Bin Liu, Anh Tran, Emmanuel Adeagbo and Bevan Baas, [http://vcl.ec * Brent Bohnenstiehl, Aaron Stillmaker, Jon Pimentel, Timothy Andreas, Bin Liu, Anh Tran, Emmanuel Adeagbo and Bevan Baas, [http://vcl.ec
    8 KB (1,031 words) - 13:09, 10 May 2019
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