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Polaris - Microarchitectures - Intel
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Polaris µarch
General Info
Arch TypeCPU
DesignerIntel
ManufacturerIntel
IntroductionFebruary 2007
Process65 nm
Core Configs80
Pipeline
TypeVLIW
Stages9
Cache
L1I Cache3 KiB/core
L1D Cache2 KiB/core
Succession

Polaris was a research microarchitecture designed by Intel Labs demonstarting the theoretical capabilities of a many-core chip performing 1 trillion floating point operations.

History

Intel originally announced and presented a Polaris wafer at the September 2006 Intel Developer Forum. Technical details were finally presented at IEEE ISSCC 2007. It was a concept project designed to demonstrate the potential of integrating many processing elements on a single silicon chip enabled by Moore's Law in order to achieve a high trillion floating point operations throughput. Polaris was Intel's first public chip as a direct consequence of their Tera-scale Computing Research Program and is the basis of Intel's later research projects which paved the way for Intel's Many Integrated Cores (MIC) architecture and the Xeon Phi many-core processor family.


intel many-core timeline.png

Architecture

Die

Two different versions of the die were presented at a few different events. The exact difference is not known.

Variant 1

SoC

  • Package LGA-1248
    • 14 layers
    • 343 signal pins
  • 65 nm process
    • 1 poly, 8 metal (Cu) layers
  • 21.72 mm x 12.64 mm
    • 274.54 mm² die size
  • 100,000,000 transistors
intel polaris die.png

Tile

  • 1.5 mm x 2.0 mm
  • 3 mm² die size
intel polaris core.png

Variant 2

Chip

  • 65 nm process
    • 1 poly, 8 metal (Cu) layers
  • 22 mm x 13.75
  • 302.5 mm² die size
intel polaris die 2.png

Tile

intel polaris core 2.png

Documents

References

  • Intel Developer Forum, September 2006
  • IEEE ISSCC 2007
codenamePolaris +
core count80 +
designerIntel +
first launchedFebruary 2007 +
full page nameintel/microarchitectures/polaris +
instance ofmicroarchitecture +
manufacturerIntel +
microarchitecture typeCPU +
namePolaris +
pipeline stages9 +
process65 nm (0.065 μm, 6.5e-5 mm) +