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Difference between revisions of "self-aligned contact"
(Created page with "{{title|Self-Aligned Contact (SAC)}} '''Self-Aligned Contact''' ('''SAC''') is a semiconductor process flow technique that adds a protective dielectric layer over the tr...") |
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Revision as of 01:07, 27 January 2019
Self-Aligned Contact (SAC) is a semiconductor process flow technique that adds a protective dielectric layer over the transistor gate in order to prevent contact-to-gate shorts. SAC is used to enable aggressive scaling of the contacted poly pitch while minimizing yield loss due to misalignment and partial overlaps of the contacts over the gate.