-
WikiChip
WikiChip
-
Architectures
Popular x86
-
Intel
- Client
- Server
- Big Cores
- Small Cores
-
AMD
Popular ARM
-
ARM
- Server
- Big
- Little
-
Cavium
-
Samsung
-
-
Chips
Popular Families
-
Ampere
-
Apple
-
Cavium
-
HiSilicon
-
MediaTek
-
NXP
-
Qualcomm
-
Renesas
-
Samsung
-
From WikiChip
Difference between revisions of "self-aligned contact"
(Created page with "{{title|Self-Aligned Contact (SAC)}} '''Self-Aligned Contact''' ('''SAC''') is a semiconductor process flow technique that adds a protective dielectric layer over the tr...") |
(No difference)
|
Revision as of 00:07, 27 January 2019
Self-Aligned Contact (SAC) is a semiconductor process flow technique that adds a protective dielectric layer over the transistor gate in order to prevent contact-to-gate shorts. SAC is used to enable aggressive scaling of the contacted poly pitch while minimizing yield loss due to misalignment and partial overlaps of the contacts over the gate.