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Difference between revisions of "intel/microarchitectures/tremont"
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=== Key changes from {{\\|Goldmont Plus}} === | === Key changes from {{\\|Goldmont Plus}} === | ||
| − | + | * [[10 nm process]] (From [[14 nm]]) | |
====New instructions ==== | ====New instructions ==== | ||
Revision as of 16:51, 4 April 2018
| Edit Values | |
| Tremont µarch | |
| General Info | |
| Arch Type | CPU |
| Designer | Intel |
| Manufacturer | Intel |
| Introduction | 2018/2019 |
| Process | 10 nm |
| Pipeline | |
| Type | Superscalar |
| OoOE | Yes |
| Speculative | Yes |
| Reg Renaming | Yes |
| Instructions | |
| ISA | x86-64 |
| Extensions | MOVBE, MMX, SSE, SSE2, SSE3, SSSE3, SSE4.1, SSE4.2, POPCNT, AES, PCLMUL, RDRND, SHA |
| Cores | |
| Core Names | Gemini Lake |
| Succession | |
Tremont is Intel's successor to Goldmont Plus, a 10 nm microarchitecture for ultra-low power devices and microservers.
Contents
Codenames
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Brands
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Release Dates
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Technology
Tremont appear to be planned for Intel's 10 nm process.
Architecture
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Preliminary Data! Information presented in this article deal with future products, data, features, and specifications that have yet to be finalized, announced, or released. Information may be incomplete and can change by final release. |
Key changes from Goldmont Plus
- 10 nm process (From 14 nm)
New instructions
Termont introduced a number of new instructions:
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CLWB- Force cache line write-back without flush -
ENCLV- SGX oversubscription instructions -
CLDEMOTE- Cache line demote instruction -
SSE_GFNI- SSE-based Galois Field New Instructions - Direct store instructions: MOVDIRI, MOVDIR64B
- User wait instructions: TPAUSE, UMONITOR, UMWAIT
- Split Lock Detection - detection and cause an exception for split locks
Facts about "Tremont - Microarchitectures - Intel"
| codename | Tremont + |
| designer | Intel + |
| full page name | intel/microarchitectures/tremont + |
| instance of | microarchitecture + |
| instruction set architecture | x86-64 + |
| manufacturer | Intel + |
| microarchitecture type | CPU + |
| name | Tremont + |
| process | 10 nm (0.01 μm, 1.0e-5 mm) + |