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Difference between revisions of "Talk:intel/loihi"
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| + | According to the article published by the Intel Labs in the IEEE Micro Feb/Mar 2018 edition, we can see that they used FinFET process for the silicon realization. But why the technology mentioned here is CMOS? <small><span class="autosigned">— Preceding [[WikiChip:Signatures|unsigned]] comment added by [[User:52.52.2.146|52.52.2.146]] ([[User talk:52.52.2.146|talk]] • [[Special:Contributions/52.52.2.146|contribs]]) </span></small><!-- Template:Unsigned --> | ||
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| + | :You are correct. They use a FinFET process (Intel's own [[14 nm]]), however, the 'technology' field in this case actually refers to the type of logic technology used (See [[Property:technology]]) such as CMOS, Bipolar, and ECL. For Loihi, Intel uses standard static CMOS cells, hence "CMOS". Hope that clarifies things a bit. --[[User:David|David]] ([[User talk:David|talk]]) 16:13, 26 November 2018 (EST) | ||
Latest revision as of 17:15, 26 November 2018
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Minor edit[edit]
According to the article published by the Intel Labs in the IEEE Micro Feb/Mar 2018 edition, we can see that they used FinFET process for the silicon realization. But why the technology mentioned here is CMOS? — Preceding unsigned comment added by 52.52.2.146 (talk • contribs)
- You are correct. They use a FinFET process (Intel's own 14 nm), however, the 'technology' field in this case actually refers to the type of logic technology used (See Property:technology) such as CMOS, Bipolar, and ECL. For Loihi, Intel uses standard static CMOS cells, hence "CMOS". Hope that clarifies things a bit. --David (talk) 16:13, 26 November 2018 (EST)