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== Overview ==  
 
== Overview ==  
 
CoWoS is a wafer-level [[chiplet|multi-chip]] [[packaging technology]] that incorporates multiple chiplets side-by-side on a [[silicon interposer]] in order to achieve better interconnect density and performance. The chiplets are bonded through [[micro-bumps]] on a silicon interposer forming a chip-on-wafer (CoW). The CoW is then subsequently thinned such that the [[TSV]] perforations are exposed. This is followed [[C4 bumps]] formation and [[singulation]]. A CoWoS package is completed thrugh bonding to a package substrate.
 
CoWoS is a wafer-level [[chiplet|multi-chip]] [[packaging technology]] that incorporates multiple chiplets side-by-side on a [[silicon interposer]] in order to achieve better interconnect density and performance. The chiplets are bonded through [[micro-bumps]] on a silicon interposer forming a chip-on-wafer (CoW). The CoW is then subsequently thinned such that the [[TSV]] perforations are exposed. This is followed [[C4 bumps]] formation and [[singulation]]. A CoWoS package is completed thrugh bonding to a package substrate.
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== Versions ==
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TSMC has introduced a number of versions since they first introduced the technology in 2012.
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=== CoWoS-1 ===
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First-generation CoWoS were primarily used for large FPGAs. CoWoS-1 had an interposer die area of up to ~800 mm², very close to [[reticle limit]]
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=== CoWoS-2 ===
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Second-geeneration of CoWoS increased the interposer size considerably through [[mask stitching]]. Originally qualified for 1200 mm², TSMC has since increased the interposer size to 1,700 mm².

Revision as of 23:04, 16 January 2019

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Chip-on-Wafer-on-Substrate (CoWoS) is a two-point-five dimensional integrated circuit (2.5D IC) through-silicon via (TSV) interposer-based packaging technology designed by TSMC.

Overview

CoWoS is a wafer-level multi-chip packaging technology that incorporates multiple chiplets side-by-side on a silicon interposer in order to achieve better interconnect density and performance. The chiplets are bonded through micro-bumps on a silicon interposer forming a chip-on-wafer (CoW). The CoW is then subsequently thinned such that the TSV perforations are exposed. This is followed C4 bumps formation and singulation. A CoWoS package is completed thrugh bonding to a package substrate.

Versions

TSMC has introduced a number of versions since they first introduced the technology in 2012.

CoWoS-1

First-generation CoWoS were primarily used for large FPGAs. CoWoS-1 had an interposer die area of up to ~800 mm², very close to reticle limit

CoWoS-2

Second-geeneration of CoWoS increased the interposer size considerably through mask stitching. Originally qualified for 1200 mm², TSMC has since increased the interposer size to 1,700 mm².