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'''Nehalem''' was the [[microarchitecture]] for [[Intel]]'s [[45 nm process]] for desktops and servers as a successor to {{\\|Penryn}}. Nehalem is named after the [[wikipedia:Nehalem River|Nehalem River]]. Nehalem was replaced by the {{\\|Westmere}} microarchitecture in 2010.
 
'''Nehalem''' was the [[microarchitecture]] for [[Intel]]'s [[45 nm process]] for desktops and servers as a successor to {{\\|Penryn}}. Nehalem is named after the [[wikipedia:Nehalem River|Nehalem River]]. Nehalem was replaced by the {{\\|Westmere}} microarchitecture in 2010.
 
[[File:Nehalem.jpg|right|thumb|300px|Nehalem wafer]]
 
[[File:Nehalem.jpg|right|thumb|300px|Nehalem wafer]]
 
== Process Technology ==
 
{| class="wikitable" style="float: right;"
 
! colspan="2" | 45 nm Manufacturing Fabs
 
|-
 
! Fab !! Location
 
|-
 
| D1D || Hillsboro, Oregon
 
|-
 
| Fab 32 || Chandler, Arizona
 
|-
 
| Fab 28 || Kiryat Gat, Israel
 
|}
 
Penryn-based [[microprocessors]] were manufactured on a [[45 nm process]]. Intel's 45 nm process is the is the first high-volume manufacturing process to introduce High-k + metal gate transistors.
 
 
Scaling:
 
 
{| class="wikitable"
 
|-
 
! !! Core !! Nehalem !! Δ !! rowspan="7" | [[File:intel 45nm gate.png|250px]]
 
|-
 
| || [[65 nm]] || [[45 nm]] ||
 
|-
 
| Metal Layers || 8 || 9 ||
 
|-
 
| Gate Pitch || 220 nm || 180 nm || 0.82x
 
|-
 
| Interconnect Pitch || 210 nm || 160 nm || 0.76x
 
|-
 
| SRAM bit cell​ (HD) || 0.570 µm² || 0.346 um² || 0.61x
 
|-
 
| SRAM bit cell​ (LP) || 0.680 µm² || 0.382 um² || 0.56x
 
|}
 
  
 
== Die Shot ==
 
== Die Shot ==

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codenameNehalem +
designerIntel +
first launchedAugust 2008 +
full page nameintel/microarchitectures/nehalem (client) +
instance ofmicroarchitecture +
instruction set architecturex86-64 +
manufacturerIntel +
microarchitecture typeCPU +
nameNehalem +
phase-outMarch 2010 +
process45 nm (0.045 μm, 4.5e-5 mm) +