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Editing 180 nm lithography process
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− | The ''' | + | The '''180 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[220 nm lithography process|220 nm process]] stopgap. Commercial [[integrated circuit]] manufacturing using 180 nm process began in late 1998. This technology was replaced by with [[150 nm lithography process|150 nm process]] (HN) in 2000 and [[130 nm lithography process|130 nm process]] (FN) in 2001. |
== Industry == | == Industry == |