From WikiChip
Template:nodes comp
Revision as of 18:11, 29 May 2017 by David (talk | contribs)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)

 
Process Name
1st Production
Lithography Lithography
Immersion
Exposure
Wafer Type
Size
Transistor Type
Voltage
Metal Layers
 
Gate Length (Lg)
Contacted Gate Pitch (CPP)
Minimum Metal Pitch (MMP)
SRAM bitcell High-Perf (HP)
High-Density (HD)
Low-Voltage (LV)
DRAM bitcell eDRAM
Value