From WikiChip
National High-Performance IC Design Center (ICC)
Revision as of 00:18, 24 April 2017 by At32Hz (talk | contribs) (Created page with "{{title|National High-Performance IC Design Center (ICC)}} {{semi company | name = National High-Performance IC Design Center | logo = | logo size...")
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)

National High-Performance IC Design Center
Type Private
Founded 2000
Shanghai, China
Founder Minister of Science and Technology of China
Shanghai municipal government

National High-Performance Integrated Circuit Design Center, Shanghai (ICC) is a semiconductor research & development center in Shanghai, China. The center was opened in 2000 through the joint forces of China's Ministry of Science and Technology and the Shanghai municipal government. ICC was formed to advance the development of domestic Chinese semiconductor industry by offering various amenities designed to attract startups such as low-cost rental of facilities equipped with the latest tools, workstations and test equipment. Additionally, ICC offers design houses and universities a multiproject wafer-processing capabilities in order to reduce foundry costs involved in the production prototype and low-volume products.

company typeprivate +
founded2000 +
founded locationShanghai, China +
founderMinister of Science and Technology of China + and Shanghai municipal government +
full page nameicc (shanghai) +
instance ofsemiconductor company +
nameNational High-Performance IC Design Center +